Indutores integrados passivos para aplicações em radio frequência

Abstract

This work aims the design and implementation of integrated passive inductors based on CMOS and BiCMOS processes. The inductors are essential devices in radio frequency applications and are used in many RF circuits such as amplifiers and oscillators. The inductors’ performance is mainly limited by metal and substrate losses. Although various methods of improvement have been proposed, the foundries still offer a reduced number of components, making far more difficult to choose the best device for each circuit. In this way, from the design and implementation of integrated inductors, the designer is able to enhance and develop new devices for each application. This works presents the experimental results of inductors based on CMOS process. These inductors have been improved with two techniques; multilevel and PGS, the first one reduce the metal losses and the second to reduce the substrate losses. This work also shows inductors improved with double PGS based on BiCMOS process. The double PGS was designed with polysilicon and n+ buried layer.